2μm波段Sb基多量子阱材料的制备_李占国(3)
时间:2025-04-23
时间:2025-04-23
第2期
李占国等:2.0μm波段Sb基多量子阱材料的制备
507
/解理成1采用了标准的光刻工艺。在10mm×10mm的小片,00 选择经过测试后质量较好的外延片,
刻蚀掩膜,清洗后烘烤,然后采用电子束蒸发工艺溅射0.1000级光刻间采用标准的光刻工艺,15μm厚度为//剥离光刻胶,清洗后,100nm的SiO0nm Ti30nmPt500nm Au,Ti层为 p型欧姆接触溅射32电流隔离层,
/粘附层,Pt层为阻挡层,Au层为接触层。机械减薄衬底至130μm左右,n型欧姆接触溅射40nm Au150
,纯氢气氛中合金3完100nm Ni420℃温度条件下,0s后n面电镀金约1000nm用于电极球焊引线,nmGe/腔长为1注入电流1.成欧姆接触工艺。制备的激光器条宽为50μm,000μm。器件阈值电流约为300mA,5A
时,最大出射功率约为2如图3所示。2mW,
3 结 论
/本文采用MB通过优化调节量子阱的生长参数,获E外延技术生长InGaAsSbAlGaAsSb多量子阱材料,
材料的发光波长约为2.得了具有高质量的多量子阱材料。室温荧光光谱表明,0μm。该结果表明通过调节生长参数和材料组分等参数可以获得质量较好的外延材料。参考文献:
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